Photomask Fabrication Technology - Benjamin G. Eynon & Banqiu Wu

Photomask Fabrication Technology

ByBenjamin G. Eynon & Banqiu Wu

  • Release Date: 2005-08-11
  • Genre: Engineering

Description

Photomasks, the printing masters for the fabrication of integrated circuits, have become a necessity of modern semiconductor manufacturing. This book details the science and technology of industrial photo mask production, including fundamental principles, industrial production flows, and technological evolution.

About "Photomask Fabrication Technology"

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